Fully automatic lithography system for automatic coating, exposure, and development process.
Coating the resist, exposure, and developing process are all done in one go. It is a device that can process automatically. This is a special device made possible by being a comprehensive manufacturer of photolithography equipment.
This product is a device that automatically performs spin coating, batch exposure, and development processing. It can be equipped with HMDS treatment, baking, and cooling functions. This device has been made possible because our company handles everything from design to manufacturing and sales, offering a lineup of photolithography equipment including coaters, aligners, and developers. The supported resists include positive and negative resists, polyimide, and various other chemicals have been successfully used. We also have extensive experience in transporting a wide range of substrates such as Si (silicon), GaAs, InP, GaN, SiC, sapphire, ceramics, and SiO2 (glass). The exposure process can be equipped with an auto-alignment function, making it ideal for positive-negative inversion processes as well. 【Features】 ■ Automatic batch processing of photolithography steps ■ Achieves low cost ■ Compatible with low to high viscosity (1.7cP to 10000cP) ■ Supports sizes from 2 to 6 inches, with proven capability for 4-inch ■ Automatic recognition of wafer sizes ■ Proven results with a variety of chemicals ■ Reduced footprint (space-saving) ■ Numerous options for resist reduction ■ Each process can operate independently ■ Auto-alignment function *For more details, please refer to the PDF document or feel free to contact us.
- 企業：エイ・エス・エイ・ピイ
- 価格：Other
